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Glass Transition Temperature and Thermal Expansion of Materials Used in High Density Interconnection (HDI) and Microvias - TMA Method

contributor authorIPC - Association Connecting Electronics Industries
date accessioned2017-09-04T17:03:19Z
date available2017-09-04T17:03:19Z
date copyright36100
date issued1998
identifier otherXWRXHAAAAAAAAAAA.pdf
identifier urihttp://yse.yabesh.ir/std;jsery=autho162s7D83081DAC426159DD6EFDEC014A/handle/yse/126881
description abstractThis test is designed to determine the glass transition temperature (Tg) and coefficient of thermal expansion (CTE) of dielectric materials used in high density interconnect (HDI) and microvias by the use of thermal mechanical analysis (TMA). For isotropic (unreinforced) materials, either method (A = thick specimen; B = thin specimen) may be used. For anisotropic materials (reinforced), both methods shall be used, since the z axis expansion (Method A) is not the same as the x-y axis expansion (Method B).
languageEnglish
titleIPC TM-650 2.4.24.5num
titleGlass Transition Temperature and Thermal Expansion of Materials Used in High Density Interconnection (HDI) and Microvias - TMA Methoden
typestandard
page5
statusActive
treeIPC - Association Connecting Electronics Industries:;1998
contenttypefulltext


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