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IEC 63068-1

contributor authorIEC - International Electrotechnical Commission
date accessioned2020-08-15T17:01:54Z
date available2020-08-15T17:01:54Z
date copyright2019.01.01
date issued2019
identifier otherZTSXGGAAAAAAAAAA.pdf
identifier urihttp://yse.yabesh.ir/std;jsessioutho1193177793325273135A68A10958014A0/handle/yse/281078
description abstractScope: This part of IEC 63068 gives a classification of defects in as-grown 4H-SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non-destructive detection methods including bright-field OM (optical microscopy), PL (photoluminescence), and XRT (X-ray topography) images.
languageEnglish
titleEnglish -- Semiconductor devices - Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices - Part 1: Classification of defects - Edition 1.0en
titleIEC 63068-1num
typestandard
page28
statusActive
treeIEC - International Electrotechnical Commission:;2019
contenttypefulltext


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