English -- Semiconductor devices - Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices - Part 1: Classification of defects - Edition 1.0
IEC 63068-1
Organization:
IEC - International Electrotechnical Commission
Year: 2019
Abstract: Scope: This part of IEC 63068 gives a classification of defects in as-grown 4H-SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non-destructive detection methods including bright-field OM (optical microscopy), PL (photoluminescence), and XRT (X-ray topography) images.
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English -- Semiconductor devices - Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices - Part 1: Classification of defects - Edition 1.0
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contributor author | IEC - International Electrotechnical Commission | |
date accessioned | 2020-09-15T22:28:48Z | |
date available | 2020-09-15T22:28:48Z | |
date copyright | 2019.01.01 | |
date issued | 2019 | |
identifier other | ZTSXGGAAAAAAAAAA.pdf | |
identifier other | ZTSXGGAAAAAAAAAA.pdf | |
identifier uri | https://yse.yabesh.ir/std/handle/yse/289115 | |
description abstract | Scope: This part of IEC 63068 gives a classification of defects in as-grown 4H-SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non-destructive detection methods including bright-field OM (optical microscopy), PL (photoluminescence), and XRT (X-ray topography) images. | |
language | English | |
title | English -- Semiconductor devices - Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices - Part 1: Classification of defects - Edition 1.0 | en |
title | IEC 63068-1 | num |
type | standard | |
page | 28 | |
status | Active | |
tree | IEC - International Electrotechnical Commission:;2019 | |
contenttype | fulltext |